Lithographic apparatus and device manufacturing method

ABSTRACT

An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation-in-part of prior U.S. patentapplication Ser. No. 10/850,451, filed May 21, 2004, entitled,Lithographic Apparatus and Device Manufacturing Method, whichapplication is incorporated herein in its entirety by reference.

FIELD

The present invention relates to a lithographic apparatus and a devicemanufacturing method.

BACKGROUND

A lithographic apparatus is a machine that applies a desired patternonto a target portion of a substrate. Lithographic apparatus can beused, for example, in the manufacture of integrated circuits (ICs). Inthat circumstance, a patterning device, such as a mask, may be used togenerate a circuit pattern corresponding to an individual layer of theIC, and this pattern can be imaged onto a target portion (e.g.comprising part of, one or several dies) on a substrate (e.g. a siliconwafer) that has a layer of radiation-sensitive material (resist). Ingeneral, a single substrate will contain a network of adjacent targetportions that are successively exposed. Known lithographic apparatusinclude so-called steppers, in which each target portion is irradiatedby exposing an entire pattern onto the target portion at one time, andso-called scanners, in which each target portion is irradiated byscanning the pattern through the projection beam in a given direction(the “scanning”-direction) while synchronously scanning the substrateparallel or anti-parallel to this direction.

It has been proposed to immerse the substrate in the lithographicprojection apparatus in a liquid having a relatively high refractiveindex, e.g. water, so as to fill a space between the projection systemand the substrate. The point of this is to enable imaging of smallerfeatures since the exposure radiation will have a shorter wavelength inthe liquid. (The effect of the liquid may also be regarded as increasingthe effective NA of the system and also increasing the depth of focus.)Other immersion liquids have been proposed, including water with solidparticles (e.g. quartz) suspended therein.

However, submersing the substrate or substrate and substrate table in abath of liquid (see for example U.S. Pat. No. 4,509,852, herebyincorporated in its entirety by reference) means that there is a largebody of liquid that must be accelerated during a scanning exposure. Thisrequires additional or more powerful motors and turbulence in the liquidmay lead to undesirable and unpredictable effects.

One of the solutions proposed is for a liquid supply system to provideliquid on only a localized area of the substrate and in between thefinal element of the projection system and the substrate using a liquidsupply system (the substrate generally has a larger surface area thanthe final element of the projection system). One way which has beenproposed to arrange for this is disclosed in PCT patent applicationpublication WO 99/49504, hereby incorporated in its entirety byreference. As illustrated in FIGS. 2 and 3, liquid is supplied by atleast one inlet IN onto the substrate, preferably along the direction ofmovement of the substrate relative to the final element, and is removedby at least one outlet OUT after having passed under the projectionsystem. That is, as the substrate is scanned beneath the element in a −Xdirection, liquid is supplied at the +X side of the element and taken upat the −X side. FIG. 2 shows the arrangement schematically in whichliquid is supplied via inlet IN and is taken up on the other side of theelement by outlet OUT which is connected to a low pressure source. Inthe illustration of FIG. 2 the liquid is supplied along the direction ofmovement of the substrate relative to the final element, though thisdoes not need to be the case. Various orientations and numbers of in-and out-lets positioned around the final element are possible, oneexample is illustrated in FIG. 3 in which four sets of an inlet with anoutlet on either side are provided in a regular pattern around the finalelement.

SUMMARY

Introduction of an immersion liquid and an associated liquid supplysystem member to lithographic apparatus may cause deterioration in theaccuracy of focus at the substrate and in the precision with which otherparameters critical to imaging are controlled.

Accordingly, it would be advantageous, for example, to overcome theseand other problems with a view to improving the performance of thelithographic apparatus.

According to an aspect of the invention, there is provided alithographic apparatus comprising:

an illumination system arranged to condition a radiation beam;

a support structure configured to hold a patterning device, thepatterning device being capable of imparting the radiation beam with apattern in its cross-section, thus providing a patterned radiation beam;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beamonto a target portion of the substrate;

a liquid supply system member configured to contain a liquid in a spacebetween the projection system and the substrate; and

a liquid supply system member compensator arranged to compensate for aninteraction between the liquid supply system member and the substratetable.

Without compensation, the weight of a liquid supply system member orother forces transmitted by the liquid supply system member on thesubstrate table may cause position dependent forces and torques on andnon-negligible deformation and/or tilt of the substrate table. Parasiticstiffness effects arising from a guiding member attached to the liquidsupply system member may cause similar effects. The de-focus at thesubstrate caused by these disturbances may be up to 1000 nm. In additionto causing position dependent de-focussing effects, these disturbancesof the substrate table also may lead to machine to machine overlayerrors (in particular between immersion and non-immersion machines). Ina case where the additional weight of the liquid supply system member iscompensated by a substrate table compensator, the effect of shiftinggravity forces caused by the liquid supply system member may lead tocross-talk problems in the servo system controlling the position of thesubstrate table. A liquid supply system member compensator may reducesome or all of the problems described above by compensating for anygravity or other force induced effects between the liquid supply systemmember and substrate table.

The liquid supply system member compensator may comprise a focuscalibration device configured to compensate a relative position of thesubstrate and a plane of best focus of the lithographic apparatusaccording to compensation data. The focus calibration device enablescompensation of the effects of the weight or other forces of the liquidsupply system member without substantial physical interaction with theliquid supply system member itself. The compensation can be implemented,for example, using software controlling the relative position of thesubstrate table via either an interpolated matrix or as an analyticalpolynomial function, each mathematical construction representing thecompensation that may be used to overcome the interaction-induceddisturbance of the substrate table. The compensation will in general bea function of position in a direction perpendicular to the optical axisof the projection system and may be recorded in Cartesian or polarcoordinates.

The compensation data may be derived from the output of a substratetable geometry measuring device configured to determine a surface heightprofile, a surface tilt profile, or both of the substrate table whendisturbed by the interaction with the liquid supply system member, thesurface height profile being defined in a direction substantiallyparallel to the optical axis of a final element of the projection systemand the surface tilt profile being defined with respect to one or twoorthogonal axes of a plane substantially perpendicular to the opticalaxis of the final element of the projection system. This approach mayallow accurate characterization of any induced disturbance.

The compensation data may be derived from a mechanical mathematicalmodel of the substrate table, which is arranged to forecast substratetable disturbance as a function of a position dependent applied force.This approach may allows compensation to be implemented with a minimumof additional measurements and/or measurement apparatus.

The compensation data maybe derived from an analysis of an exposed focustest pattern, arranged to reveal the extent of focus error as a functionof position. This approach may provide accurate characterization withoutadditional measurement components.

The exposed focus test pattern may be imaged on a reference lithographyapparatus subjected to forces substantially equivalent to theinteraction between the liquid supply system member and the substratetable. This approach may allow accurate characterization of disturbancesdue to the liquid supply system member without interfering with the mainlithography apparatus. The reference apparatus may specialize inmeasuring the focus test pattern and therefore be simpler and moreefficient for these measurements than the main lithography apparatus.

In a dual stage lithographic apparatus, the system focus is typicallycalibrated via a substrate map made without the immersion liquid andliquid supply system member being present. In such an arrangement, thebending effect is not taken into account, which causes de-focus effectsto occur when imaging is carried out with the liquid supply systemmember in place.

The substrate table geometry measuring device may be configured todetermine the surface height profile, the surface tilt profile, or bothof the substrate table as a function of the position of the liquidsupply system member relative to the substrate table in a planesubstantially perpendicular to the optical axis of the final element ofthe projection system. This feature may take into account the fact thatthe disturbance at a point on the substrate table due to the interactionwith the liquid supply system member is not in general a function onlyof the distance of the point from the liquid supply system member.Torques will depend on the position of forces relative to pivot axes andthe local response to stresses may vary over the substrate table.

The liquid supply system member compensator may comprise a liquid supplysystem member suspension device capable of applying a force to theliquid supply system member to at least partially compensate for theinteraction between the liquid supply system member and the substratetable. As an alternative to allowing the distortion and/or tilt to occurand compensating for their effects, this feature may make it possible toprevent disturbances occurring in the first place. This approach has apossible advantage of eliminating calibration measurements, which may bemachine specific, have to be repeated and have a limited accuracy.

The liquid supply system member suspension device may be configured tocouple to a frame supporting at least a part of the projection system,the frame being capable of supporting via the coupling at least a partof the reaction to the force applied by the liquid supply system membersuspension device to the liquid supply system member. Although typicallylocated further away from the liquid supply system member than the finalelement of the projection system, supporting the weight of the liquidsupply system member directly by the frame holding the projection systemmay greatly reduce the possibility of any distortion or change inorientation of elements of the projection system.

The liquid supply system member suspension device may be configured tocouple to the projection system, the projection system being capable ofsupporting via the coupling at least a part of the reaction to the forceapplied by the liquid supply system member suspension device to theliquid supply system member. An advantage of this arrangement is thatthe projection system is in very close proximity to the liquid supplysystem member, and may be sufficiently massive not to be significantlydistorted by the additional weight or other forces of the liquid supplysystem member.

The liquid supply system member suspension device may be configured tocouple to a frame that is substantially mechanically isolated from theprojection system, the isolated frame being capable of supporting viathe coupling at least part of the reaction force applied by the liquidsupply system member suspension device to the liquid supply systemmember. This arrangement has the advantage of minimizing the possibilityof any distortion or change in orientation of elements of the projectionsystem. “Substantially mechanically isolated from” may mean, forexample, not in direct mechanical contact with or not in closemechanical contact with (i.e. any mechanical link is made only by meansof a substantial number of intermediate connections, or a passive oractive bearing, for example). For example, the isolated frame may be amachine base frame, configured to support major components of thelithography apparatus via bearings. The machine base frame may bemassive enough and sufficiently well isolated from the outside world toensure that vibrations and other disturbances from the outside world arenot transmitted to the liquid supply system member. A coupling based onLorentz actuators (using electromagnetic forces) may be particularlysuitable for this embodiment as it avoids the need for direct mechanicalcontact between the isolated frame and the liquid supply system member,which might otherwise require precise alignment and expensivemanufacturing tolerances to realize.

The lithographic apparatus may comprise a liquid supply system membersuspension device controller configured to apply a control force to theliquid supply system member, via the liquid supply system membersuspension device, according to data representing the magnitude of theinteraction between the liquid supply system member and the substratetable. This arrangement may provide a flexible and efficient way tocompensate for forces arising between a liquid supply system member andthe substrate table. It may easily be adapted for different combinationsof liquid supply system member and substrate table and differentenvironmental conditions.

The interaction discussed above may arise due to the weight of theliquid supply system member acting on the substrate table. Externalforces, however, arising from elements other than the liquid supplysystem member may also play a role. These forces may be static, like theweight of the liquid supply system member, or dynamic (time-varying).Examples of time-varying forces may be those that arise due to straymagnetic fields. Also, the interaction may be position dependent, with asize and distribution within the liquid supply system member thatdepends on the position of the liquid supply system member. This mayoccur, for example, for electromagnetically mediated forces as theposition of the liquid supply system member relative to other componentsof the lithography apparatus is varied.

The lithographic apparatus may comprise a liquid supply system membersuspension device controller and a liquid supply system member positiondetermining device, the liquid supply system member suspension devicecontroller being configured to apply a control force to the liquidsupply system member, via the liquid supply system member suspensiondevice, based on a position of the liquid supply system member asmeasured by the liquid supply system member position determining device.This arrangement may provide a direct means for dealing with forces thatmaybe exerted on the liquid supply system member by the liquid supplysystem member, such as a vertical guide member, which may be a knownfunction of the position of the liquid supply system member. In otherwords, the interaction may be liquid supply system member positiondependent, with a size and distribution within the liquid supply systemmember that depends on the position of the liquid supply system member.This may occur, for example, with electromagnetically mediated forces asthe position of the liquid supply system member relative to electricallyactive components of the lithographic apparatus is varied.

The liquid supply system member position determining device maydetermine a position of the liquid supply system member along an axissubstantially parallel to the optical axis of the projection system,relative to the projection system, a frame supporting at least a part ofthe projection system, or a frame substantially mechanically isolatedfrom the projection system but which supports the reaction to the forceapplied by the liquid supply system member suspension device to theliquid supply system member.

The liquid supply system member position determining device maydetermine a position of the liquid supply system member in a directionsubstantially perpendicular to the optical axis of the projectionsystem.

The control force may be applied so as to compensate for forces arisingfrom a liquid supply system member guiding member attached between theliquid supply system member and a frame supporting at least a part ofthe projection system.

The lithographic apparatus may comprise a substrate table forcecompensator configured to determine the magnitude of the interactionbetween the liquid supply system member and the substrate table andtransmit data representing the magnitude to the liquid supply systemmember suspension device. The substrate table force compensatorgenerates forces on the substrate table to keep the substrate table at adesired position (the substrate table motors may also be arranged tooperate in a similar way). These control forces are a function of theposition of the substrate table with respect to the projection system orframe supporting at least a, part of the projection system. A controlloop may be provided to ensure that this separation remainssubstantially constant. When a liquid supply system member is added tothe substrate table, the actuating force maintaining the substrate tableat the desired separation from the frame should be increased in order tocompensate the interaction between the liquid supply system member andthe substrate table (such as that due to the weight of the liquid supplysystem member). Although these interactions are compensated by thesubstrate table force compensator, because the actuator operates on theentire substrate table, it does not reduce the disturbances induced inthe substrate table. However, according to an embodiment, theinformation concerning the additional forces associated with the liquidsupply system member may be forwarded to the liquid supply system membersuspension device, which may use this information independently tocompensate for the forces arising from the liquid supply system memberby applying an opposing force equal in magnitude to the weight (or otherforces) of the liquid supply system member. As well as possiblyachieving an advantage discussed above associated with preventingdisturbances to the substrate table, this arrangement may also improvethe stability of the low-frequency frame mountings supporting at leastapart of the projection system. Without the liquid supply system membersuspension device, the low-frequency frame mountings may experience themass of the projection system and frame with and without the liquidsupply system member. During lowering of the liquid supply system memberto the substrate, the low-frequency frame mountings may be disturbedbecause the weight of the liquid supply system member is suddenlyabsent. When raising the liquid supply system member, the oppositeoccurs. The disturbances caused by the above effects may be dealt withby providing a settling time for the system to return to an equilibriumstate. By removing the cause of the disturbances and therefore suchsettling times, it may be possible to improve the throughput of thelithography apparatus.

Using the control loop associated with the substrate table forcecompensator has a possible advantage of being active in the sense thatthe compensating force applied by the liquid supply system membersuspension device does not have to be fixed in advance and may respondto variations in the effective weight of the liquid supply system memberover time, at different locations in the world, or if the liquid supplysystem member guiding has some offset forces or parasitic stiffness.

The liquid supply system member suspension device may operate by meansof at least one mechanism selected from the following list: anelectromagnetic force using the Lorentz principle, an electromagneticforce using the reluctance principle, a bellows, and a mechanicalspring. The electromagnetic force may be a passive magnetic force, forexample. The bellows may operate by means of fluid, either gaseous orliquid. The mechanical spring may be constructed from an elasticmaterial such as a metal. In each case, a suitable damping component maybe incorporated into the suspension device so that it may achievedesired performance characteristics. An example of a device capable ofproviding a compensation force in combination with a damper is a bellowswith a certain volume in combination with a gas restriction.

The liquid supply system member suspension device may be configured tolift the liquid supply system member clear of the substrate table forsubstrate table exchange. Normally, a separate device is used to performthis operation. By adapting the liquid supply system member compensatorto perform this function, it may possible to reduce the number ofcomponents making up the lithography apparatus.

The liquid supply system member suspension device may be configured toposition the liquid supply system member clear of the substrate table ina distal safety position in response to a system failure. A possibilityfor substrate table exchange is raising the liquid supply system memberby using bellows or any other lifting mechanism. These bellows may bearranged to raise the liquid supply system member in response to certainmodes of system failure. For other modes of failure, the bellowsthemselves may fail (such as when the pressurized gas driving thebellows fails). Using a liquid supply system member suspension device asa safety device in the event of system failure has a possible advantageof reducing the number of system components, but also of providing amore comprehensive safety feature, which may be designed to lift theliquid supply system member clear for any system failure.

The lithographic apparatus may comprise a liquid supply system membersuspension device that comprises:

a housing comprising a pressure medium;

a first piston slidably engaged within a first wall of the housingnearest the liquid supply system member, and coupled to the liquidsupply system member;

a second piston, forced towards the first piston by a pre-tensionedspring, and slidably engaged within a second wall of the housingopposite the first wall; and

a pressure regulator configured to control the pressure within thehousing, the pressure acting to apply a force to the first piston in adirection substantially parallel to the optical axis of the projectionsystem and directed towards the liquid supply system member, and apply aforce in the opposite direction to the second piston, wherein,

in a normal operating mode, the first and second pistons are arranged tointeract with each other, the pressure regulator being arranged tocontrol the vertical position of the liquid supply system member byvarying the pressure within the housing;

at pressures within the housing below a lower threshold pressure, thepre-tension in the spring is arranged to dominate the motion of thesecond piston; which forces the first piston and the liquid supplysystem member into a safety position clear of the substrate table; and

at pressures within the housing above an upper threshold pressure, thepressure medium force is arranged to dominate and forces the firstpiston clear of the second piston and the liquid supply system memberinto a safety position clear of the substrate table. This feature mayprovide a reliable and controllable way for regulating the position ofthe liquid supply system member via a pressure regulator, in such a waythat the liquid supply system member is transferred to a safety positionwhen the pressure provided by the pressure regulator falls outside ofsafety margins defined by upper and lower pressure thresholds.

According to a further aspect of the invention, there is provided adevice manufacturing method comprising:

containing a liquid in a space between a projection system of alithographic apparatus and a substrate table using a liquid supplysystem member;

compensating for an interaction between the liquid supply system memberand the substrate table; and

projecting a patterned radiation beam through the liquid onto a targetportion of the substrate using the projection system.

According to a further aspect of the invention, there is a lithographicapparatus focus calibration method, comprising:

containing a liquid in a space between a projection system of alithography apparatus and a substrate table of the lithography apparatususing a liquid supply system member;

determining a surface height profile, a surface tilt profile, or both ofthe substrate table when disturbed by an interaction with the liquidsupply system member, the surface height profile being defined in adirection substantially parallel to the optical axis of a final elementof the projection system and the surface tilt profile being defined withrespect to one or two orthogonal axes of a plane substantiallyperpendicular to the optical axis of the final element of the projectionsystem; and

determining compensation data to compensate the relative position of thesubstrate and the plane of best focus of the lithography apparatus.

According to a further aspect of the invention, there is provided alithographic apparatus focus calibration method, comprising:

projecting a radiation beam imparted with a focus test pattern, througha liquid, onto a target portion of a substrate, using a projectionsystem of a lithography apparatus;

analyzing the projected focus test pattern on the substrate to determinefocus error at a plurality of positions;

determining compensation data to compensate the relative position of thesubstrate and the plane of best focus of the lithography apparatus.

According to a further aspect, there is provided a lithographicapparatus, comprising:

a substrate table configured to hold a substrate;

a projection system arranged to project a patterned beam of radiationonto a target portion of the substrate;

a liquid supply system member configured to contain a liquid in a spacebetween the projection system and the substrate; and

a liquid supply system member compensator configured to apply a force tothe liquid supply system member to at least partially compensate for aninteraction between the liquid supply system member and the substratetable and coupled to a frame that is substantially mechanically isolatedfrom the projection system, the isolated frame capable of supporting atleast part of a reaction to a force applied by the liquid supply systemmember compensator to the liquid supply system member.

According to a further aspect, there is provided a lithographicapparatus, comprising:

a substrate table configured to hold a substrate;

a projection system arranged to project a patterned beam of radiationonto a target portion of the substrate;

a liquid supply system member configured to contain a liquid in a spacebetween the projection system and the substrate; and

a liquid supply system member compensator configured to compensate for aforce exerted by the liquid supply system member toward the substratetable.

According to a further aspect, there is provided a device manufacturingmethod, comprising:

containing a liquid in a space between a projection system of alithographic apparatus and a substrate table using a liquid supplysystem member;

compensating for an interaction between the liquid supply system memberand the substrate table by using a liquid supply system membercompensator coupled to a frame that is substantially mechanicallyisolated from the projection system; and

projecting a patterned radiation beam through the liquid onto a targetportion of the substrate using the projection system.

Although specific reference may be made in this text to the use oflithographic apparatus in the manufacture of ICs, it should beunderstood that the lithographic apparatus described herein may haveother applications, such as the manufacture of integrated opticalsystems, guidance and detection patterns for magnetic domain memories,liquid-crystal displays (LCDs), thin-film magnetic heads, etc. Theskilled artisan will appreciate that, in the context of such alternativeapplications, any use of the terms “wafer” or “die” herein may beconsidered as synonymous with the more general terms “substrate” or“target portion”, respectively. The substrate referred to herein may beprocessed, before or after exposure, in for example a track (a tool thattypically applies a layer of resist to a substrate and develops theexposed resist) or a metrology or inspection tool. Where applicable, thedisclosure herein may be applied to such and other substrate processingtools. Further, the substrate may be processed more than once, forexample in order to create a multi-layer IC, so that the term substrateused herein may also refer to a substrate that already contains multipleprocessed layers.

The terms “radiation” and “beam” used herein encompass all types ofelectromagnetic radiation, including ultraviolet (UV) radiation (e.g.having a wavelength of 365, 248, 193, 157 or 126 nm).

The term “patterning device” used herein should be broadly interpretedas referring to any device that can be used to impart a projection beamwith a pattern in its cross-section such as to create a pattern in atarget portion of the substrate. It should be noted that the patternimparted to the projection beam may not exactly correspond to thedesired pattern in the target portion of the substrate. Generally, thepattern imparted to the projection beam will correspond to a particularfunctional layer in a device being created in the target portion, suchas an integrated circuit.

The patterning device may be transmissive or reflective. Examples ofpatterning devices include masks, programmable mirror arrays, andprogrammable LCD panels. Masks are well known in lithography, andinclude mask types such as binary, alternating phase-shift, andattenuated phase-shift, as well as various hybrid mask types. An exampleof a programmable mirror array employs a matrix arrangement of smallmirrors, each of which can be individually tilted so as to reflect anincoming radiation beam in different directions; in this manner, thereflected beam is patterned. In each example of a patterning device, thesupport structure may be a frame or table, for example, which maybefixed or movable as required and which may ensure that the patterningdevice is at a desired position, for example with respect to theprojection system. Any use of the terms “reticle” or “mask” herein maybe considered synonymous with the more general term “patterning device”.

The term “projection system” used herein should be broadly interpretedas encompassing various types of projection system, including refractiveoptical systems, reflective optical systems, and catadioptric opticalsystems, as appropriate for example for the exposure radiation beingused, or for other factors such as the use of an immersion liquid or theuse of a vacuum. Any use of the term “lens” herein may be considered assynonymous with the more general term “projection system”.

The illumination system may also encompass various types of opticalcomponents, including refractive, reflective, and catadioptric opticalcomponents for directing, shaping, or controlling the projection beam ofradiation, and such components may also be referred to below,collectively or singularly, as a “lens”.

The lithographic apparatus may be of a type having two (dual stage) ormore substrate tables (and/or two or more mask tables). In such“multiple stage” machines the additional tables may be used in parallel,or preparatory steps may be carried out on one or more tables while oneor more other tables are being used for exposure.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of exampleonly, with reference to the accompanying schematic drawings in whichcorresponding reference symbols indicate corresponding parts, and inwhich:

FIG. 1 depicts a lithographic apparatus according to an embodiment ofthe invention;

FIG. 2 depicts a liquid supply system for supplying liquid to a spacebetween the projection system and the substrate according to anembodiment of the invention;

FIG. 3 depicts the arrangement of inlets and outlets of the liquidsupply system of FIG. 2 around the final element of the projectionsystem according to an embodiment of the invention;

FIG. 4 depicts a liquid supply system according to an embodiment of theinvention;

FIG. 5 depicts a projection system interacting with a substrate tablegeometry measuring device, calibration data storage device and focuscalibration device according to an embodiment of the invention;

FIG. 6 depicts embodiments of the invention wherein the seal member issupported by a suspension device in mechanical contact with either theprojection system or the frame supporting the projection system;

FIG. 7 depicts an embodiment of the seal member suspension devicecomprising mechanical springs;

FIG. 8 depicts an embodiment of the seal member suspension devicewherein the lifting force applied to the seal member is a passivemagnetic force;

FIG. 9 depicts an embodiment of the invention comprising a seal membersuspension device controller and a seal member suspension devicecontroller memory;

FIG. 10 depicts the seal member compensator arranged so as to interactwith a control loop associated with a substrate table compensatoraccording to an embodiment of the invention;

FIG. 11 depicts the seal member suspension device arranged to be capableof lifting the seal member clear of the substrate table for substratetable exchange and/or for positioning the seal member clear of thesubstrate table in a distal safety position in response to a systemfailure; and

FIG. 12 depicts a graph showing the performance of the seal membersuspension device in terms of the actuated position of the seal memberas a function of over-pressure applied to the suspension device.

DETAILED DESCRIPTION

FIG. 1 schematically depicts a lithographic apparatus according to aparticular embodiment of the invention. The apparatus comprises:

-   an illumination system (illuminator) IL for providing a projection    beam PB of radiation (e.g. UV radiation or EUV radiation).-   a support structure (e.g. a mask table) MT for supporting a    patterning device (e.g. a mask) MA and connected to a first    positioning device PM for accurately positioning the patterning    device with respect to item PL;-   a substrate table (e.g. a wafer table) WT for holding a substrate    (e.g. a resist-coated wafer) W and connected to a second positioning    device PW for accurately positioning the substrate with respect to    item PL; and-   a projection system (e.g. a refractive projection lens) PL for    imaging a pattern imparted to the projection beam PB by patterning    device MA onto a target portion C (e.g. comprising one or more dies)    of the substrate W.

As here depicted, the apparatus is of a transmissive type (e.g.employing a transmissive mask). Alternatively, the apparatus may be of areflective type (e.g. employing a programmable mirror array of a type asreferred to above).

The illuminator IL receives a beam of radiation from a radiation sourceSO. The source and the lithographic apparatus may be separate entities,for example when the source is an excimer laser. In such cases, thesource is not considered to form part of the lithographic apparatus andthe radiation beam is passed from the source SO to the illuminator ILwith the aid of a beam delivery system BD comprising for examplesuitable directing mirrors and/or a beam expander. In other cases thesource may be integral part of the apparatus, for example when thesource is a mercury lamp. The source SO and the illuminator IL, togetherwith the beam delivery system BD if required, may be referred to as aradiation system.

The illuminator IL may comprise adjusting means AM for adjusting theangular intensity distribution of the beam. Generally, at least theouter and/or inner radial extent (commonly referred to as σ-outer andσ-inner, respectively) of the intensity distribution in a pupil plane ofthe illuminator can be adjusted. In addition, the illuminator ILgenerally comprises various other components, such as an integrator INand a condenser CO. The illuminator provides a conditioned beam ofradiation, referred to as the projection beam PB, having a desireduniformity and intensity distribution in its cross-section.

The projection beam PB is incident on the mask MA, which is held on themask table MT. Having traversed the mask MA, the projection beam PBpasses through the lens PL, which focuses the beam onto a target portionC of the substrate W. With the aid of the second positioning device PWand position sensor IF (e.g. an interferometric device), the substratetable WT can be moved accurately, e.g. so as to position differenttarget portions C in the path of the projection beam PB. Similarly, thefirst positioning device PM and another position sensor (which is notexplicitly depicted in FIG. 1) can be used to accurately position themask MA with respect to the path of the projection beam PB, e.g. aftermechanical retrieval from a mask library, or during a scan. In general,movement of the object tables MT and WT will be realized with the aid ofa long-stroke module (coarse positioning) and a short-stroke module(fine positioning), which form part of the positioning devices PM andPW. However, in the case of a stepper (as opposed to a scanner) the masktable MT may be connected to a short stroke actuator only, or may befixed. Mask MA and substrate W may be aligned using mask alignment marksM1, M2 and substrate alignment marks P1, P2.

The depicted apparatus can be used in the following preferred modes:

-   1. In step mode, the mask table MT and the substrate table WT are    kept essentially stationary, while an entire pattern imparted to the    projection beam is projected onto a target portion C at one time    (i.e. a single static exposure). The substrate table WT is then    shifted in the X and/or Y direction so that a different target    portion C can be exposed. In step mode, the maximum size of the    exposure field limits the size of the target portion C imaged in a    single static exposure.-   2. In scan mode, the mask table MT and the substrate table WT are    scanned synchronously while a pattern imparted to the projection    beam is projected onto a target portion C (i.e. a single dynamic    exposure). The velocity and direction of the substrate table WT    relative to the mask table MT is determined by the    (de-)magnification and image reversal characteristics of the    projection system PL. In scan mode, the maximum size of the exposure    field limits the width (in the non-scanning direction) of the target    portion in a single dynamic exposure, whereas the length of the    scanning motion determines the height (in the scanning direction) of    the target portion.-   3. In another mode, the mask table MT is kept essentially stationary    holding a programmable patterning device, and the substrate table WT    is moved or scanned while a pattern imparted to the projection beam    is projected onto a target portion C. In this mode, generally a    pulsed radiation source is employed and the programmable patterning    device is updated as required after each movement of the substrate    table WT or in between successive radiation pulses during a scan.    This mode of operation can be readily applied to maskless    lithography that utilizes a programmable patterning device, such as    a programmable mirror array of a type as referred to above.

Combinations and/or variations on the above described modes of use orentirely different modes of use may also be employed.

Another immersion lithography solution which has been proposed is toprovide the liquid supply system with a seal member which extends alongat least a part of a boundary of the space between the final element ofthe projection system and the substrate table. The seal member issubstantially stationary relative to the projection system in the XYplane though there may be some relative movement in the Z direction (inthe direction of the optical axis). A seal is formed between the sealmember and the surface of the substrate. In an implementation, the sealis a contactless seal such as a gas seal. Such a system is disclosed in,for example, U.S. patent application Ser. No. 10/705,783, herebyincorporated in its entirety by reference.

FIG. 5 depicts a seal member compensator 2 comprising a focuscalibration device 6 and data storage device 8 according to anembodiment of the invention. In the arrangement shown, seal member 4contains immersion liquid 13 in the region between the final element ofthe projection system PL and the substrate W and/or substrate table WT.The weight of as well as other forces transmitted by, the seal member 4,if uncompensated, may cause deformation and/or tilt of the substratetable WT. The force distribution from the seal member 4 is non-uniformin the plane perpendicular to the optical axis of the final element ofthe projection system PL. In the coordinate system shown in FIG. 5,which is also relevant to the other Figures, this plane corresponds tothe XY plane and the optical axis of the final element of the projectionsystem PL corresponds to the Z-axis. For example, the non-uniformity ofthe gravity forces acting on the substrate table WT due to the sealmember 4 are indicated by arrows 10 and 12, larger arrows indicatinglarger forces. Vertical guide members 15 attached between the sealmember 4 and a frame 16 supporting the final element of the projectionsystem PL, may also transmit forces via anchor points 11, as indicatedby arrows 17. In general, the disturbances suffered by the substratetable WT arise from a complex distribution of forces and torques causedby the seal member 4 and will depend on the relative position of theseal member 4 with respect to the substrate table WT. Withoutcompensation, these forces may lead to de-focus effects when a substrateW on the substrate table WT is exposed. For example, in a dual stagelithographic apparatus, wherein a geometrical map of the substrate W ismade under a separate measurement system before the substrate table WTis positioned beneath the projection system PL with the seal member 4and immersion liquid 14 in place, the geometrical substrate map may bein error since the seal member 4 was not in place while the substratemap was being made. The distortion of the substrate table WT due toforces from the seal member 4 may not only cause de-focus at thesubstrate W but may also affect machine to machine overlay (inparticular immersion versus non-immersion) and may also affect theaccuracy of the positioning of the substrate table WT, which is adjustedaccording to measurements made by an interferometer operating byreflecting light from lateral reflective side regions of the substratetable WT.

According to an embodiment, disturbances of the substrate table WT, suchas bending under the weight of the seal member 4, can be compensated forby calibration of the effect. A substrate table geometry measuringdevice 14 is provided to determine the surface height profile of thesubstrate table WT when it is being deformed and/or tilted byinteraction with the seal member 4. The surface height profile is theposition of the surface as measured along the Z-axis as a function ofposition in the XY plane, and corresponds to the geometrical substratemap as may be recorded at the measuring position in a dual stagelithographic apparatus. Measurements of the surface height profilecarried out by the substrate table geometry measuring device 14 shouldbe repeated for different positions of the seal member 4 relative to thesubstrate table WT. Similarly, the surface tilt profile of the substratetable WT may be determined, the surface tilt profile including the Rxand/or Ry tilt of the surface as a function of position in the XY planeThe results of the measurements are stored in a data storage device 8,which is accessible by the focus calibration device 6. Based on thecurrent horizontal position of the seal member 4 relative to thesubstrate table WT, the focus calibration device 6 calculatescompensation data to transmit to a substrate table servo system 9,capable of adjusting the position (e.g., height and/or tilt) of thesubstrate table WT in order to compensate for de-focus effects arisingfrom distortion. The focus calibration device 6 effectively aims tobring each point on the substrate W to the plane of best focus at thepoint of imaging. In practice, the focus calibration device 6 may beimplemented in software arranged to run on a suitably programmedcomputer.

The disturbance of the substrate table WT maybe modelled as ananalytical mathematical function, Z_(comp)=Z(X,Y), which may comprise apolynomial function or power series expansion. For example, thefollowing function may be used: Z=aX+bY+cŶ2+ . . .+uX̂2Ŷ2+vX̂4+wŶ4+f(X,Y), where f(X,Y) represents the residuals not coveredin the rest of the power series. Tilts around the X and Y axes arecalculated by differentiating the power series. A preference for afunction in terms of X and Y coordinates may occur if the effect is notcircularly symmetric, due to the geometry of the relevant elements ofthe substrate table (such as the support structure of the substratetable). In the case where the geometry tends towards triangular, aZernike series of coefficients would be favored. The coefficients andresidual function in Z_(comp) may be determined from one or more of thefollowing: a) a mechanical mathematical model of the substrate table,which forecasts the substrate table disturbance (deformation and/ortilt) as a function of the position of the seal member and theinteraction force; b) calibration results from a test exposing a focustest pattern, from which the focus error at the exposed position can bedetermined; c) using the measured results from b) in a reference machinewith an equivalent force applied to the substrate table as that appliedby the seal member in the actual lithographic apparatus to becompensated; or d) a combination of one or more of a), b) and c).

The substrate table may also be deformed after the substrate is attachedto it if the subs Late and/or substrate table changes temperature. Thismay be dealt with using a feedforward mechanism based on a compensationfunction as discussed above or, alternatively, using a feedbackmechanism with one or more temperature sensors arranged within thesubstrate table.

As an alternative to altering the performance of the projection systemitself in order to take account of the disturbance of the substratetable WT, a further embodiment of the seal member compensator operatesby physically supporting the seal member 4 and thereby preventing theassociated distortion of the substrate table WT at source. FIG. 6depicts possible embodiments according to this aspect of the invention.Arrow 24 represents a downward force acting on the seal member 4, whichmay be a force of gravity due to its weight. The equal and oppositesupporting force supplied by a seal member compensator is indicated byarrow 22. In order to supply such a force, the seal member compensatormust couple (mechanically or otherwise) to an element solid enough thatno disadvantageous distortions will occur due to the additional forcefrom the seal member 4. One way in which this may be achieved is bycoupling the seal member 4 to a frame supporting the projection systemPL (which frame may support various metrology devices, such as a focussensor and/or alignment sensor). The resulting forces are indicated byarrows 18 and the coupling itself by broken lines 23. In thisembodiment, the coupling 23 may be made to either or both of a frame 16supporting the projection system PL and an isolated frame 21, which hasno direct or close mechanical connection to the substrate table WT orprojection system PL. This arrangement has the advantage of minimizingdisturbance of delicate elements of the projection system PL. As analternative, however, it may be possible to arrange some form ofcoupling with the final element of the projection system PL. Theresulting downwards force is illustrated by arrow 20. This arrangementhas an advantage in that the projection system PL is in close proximityto the seal member 4 but care must be taken not to affect the opticalperformance of the projection system PL.

FIGS. 7 and 8 illustrate in more detail how the seal member 4 may infact be supported by a seal member suspension device 26, 28 forming partof the seal member compensator. The compensation force can, for example,be a soft mechanical pre-loaded spring, a soft pneumatic bellow and/or apassive magnetic force. FIG. 7 shows an embodiment of the seal membersuspension device 26 wherein the compensation force is of a generalmechanical type, such as a spring. In the case where bellows are used asa mechanical seal member suspension device 26, the bellows medium may beeither a liquid or a gas. FIG. 8 shows an embodiment of the seal membersuspension device 28 wherein the compensation force is provided viaelectromagnetic Lorentz or reluctance actuators 29, which may exert aforce on the seal member 4 without mechanical contact being made. Ingeneral, some form of damping force, perhaps proportional to the rate ofchange of displacement of the seal member with respect to time, may alsobe used in order to avoid abrupt displacement of the seal member 4,oscillation of the seal member 4, or, more generally, to achieve adesired response characteristic. In both FIGS. 7 and 8, broken lines 27indicate that the reaction of the force applied to the seal member 4maybe supported via a portion of the projection system PL, a framesupporting the projection system PL, or a frame substantiallymechanically isolated from the projection system PL and substrate tableWT or any combination thereof.

FIG. 9 shows an embodiment of the invention comprising a seal membersuspension device controller 31 and a seal member suspension devicecontroller memory 33. The seal member suspension device controller 31 ishere configured to control the magnitude of a compensation force appliedto the seal member 4 via seal member suspension device 26 (although itmay equally be seal member suspension device 28 or some combination). Inorder to determine an effective magnitude of the compensation force, theseal member suspension device controller 31 may use input from varioussources. One possibility is simply to store a compensation value in aseal member suspension device controller memory 33, accessible by theseal memory suspension device controller 31. The stored compensationvalue may represent, for example, the weight of the seal member 4, aforce applied via vertical guide members 15, and/or the size of someother force known to be acting on the seal member 4.

The seal memory suspension device controller 31 may also receive inputfrom position sensors 35 and/or 39, which are arranged to measure thevertical and horizontal positions respectively of the seal member 4, asindicated schematically by arrows 37 and 41 respectively. In animplementation, the position sensors 35 and 39 are connected to theframe 16 supporting the projection system PL although either or both ofthem maybe connected to another part of the lithographic apparatus.Using data stored in the seal member suspension device controller memory33, for example, the vertical position of the seal member 4 may be usedto calculate the size of forces exerted by the vertical guide members15. Alternatively or additionally, where the forces acting on the sealmember 4 depend on its horizontal position (i.e. the position in the X-Yplane), the output from sensor 39 (which could comprise two or moresensors in order to determine both X and Y coordinates), is used asinput to the seal member suspension device controller 31. Of course,other positions, such as tilts, of the seal member may be measured andused. As before, the compensation force to apply may be calculated basedon data stored in the seal member suspension device controller memory 33describing the position dependence of the force acting on the sealmember 4. This data may be derived from calculation or from calibrationmeasurements.

According to an embodiment of the invention, depicted in FIG. 10, anaccurate compensation may be achieved using a seal member suspensiondevice 26, 28 that is controlled as a function of the vertical forceprovided by a Z-actuator 42 of a substrate table compensator 30. In anormal (i.e. non-immersion) operation, the weight of the substrate tableWT may be compensated by a control circuit forming part of the substratetable compensator 30, which acts to control the vertical and/or tilt(i.e. Z, Rx and/or Ry) position of the substrate table WT, by referencefor example to a spatial separation between the frame 16 and thesubstrate table WT as measured by a sensor 36. If the seal member 4 islowered and bears on the substrate table WT, an extra vertical force tocounteract the weight of the seal member will be generated by asubstrate table controller 32 (e.g. a PID low pass controller), formingpart of the control circuit. Arrows 38 represent the applied forcesopposing the weight of the seal member 4 indicated by arrow 40.

According to the present embodiment, the extra vertical force forms theinput (i.e. set-point) for a seal member controller 34 (e.g. a PI lowpass controller), forming part of the seal member compensator drivingthe seal member suspension device 26, 28, which may connect the sealmember 4 and the frame 16 supporting the final element of the projectionsystem PL (or, alternatively, connected the seal member 4 and the finalelement of the projection system PL itself). The seal member controller34 generates a vertical force that will lift and/or tilt the seal member4. The substrate table actuator 42 will no longer have to generate acompensation force in respect of the seal member 4 because this isprovided by the seal member suspension device 26, 28. As in previousembodiments, the substrate table WT may no longer be deformed and/ortilted by the weight of the seal member 4, or from other forces arisingfrom the seal member 4.

An accuracy of 1.0% is very feasible using compensation according to theabove embodiment. In the case where the de-focus error is 400 nm, theerror is reduced to approximately 4 nm or less, which should beacceptable for most purposes. The expected substrate table deformationand/or tilt becomes negligible under these circumstances, resulting ingood machine to machine overlay. A further advantage is that thecross-talk in a substrate table short stroke actuator system, which isresponsible for positioning the substrate table WT in the X, Y and Zdirections, and for controlling substrate table WT tilt, becomes verysmall because the effect of shifting gravity forces, associated withvariations in the effective weight of the seal member 4 and withvariations in the position of the seal member 4 with respect to thesubstrate table WT, no longer occurs. The result is a more accuratestage positioning.

The seal member suspension device 26, 28 may be arranged, according to afurther embodiment of the invention, to combine the functions ofsupporting the seal member 4 for the purposes of avoiding deformationand/or tilt of the substrate table WT with supporting the seal member 4in a safe, normally raised, position for the purposes of exchanging thesubstrate table WT, or elements thereof, and/or for faithfully reactingto emergencies such as disconnected hoses in pressurized gas systems,power supply failures, or emergencies caused by the substrate table WTitself. As will be understood, the seal member suspension device 26, 28may also simply be arranged to support the seal member 4 in a safe,normally raised, position for the purposes of exchanging the substratetable WT, or elements thereof and/or to provide a safety mechanism incase of system failure as described.

The arrangement is depicted in FIG. 11. Here, an embodiment of the sealmember suspension device 26 comprises a housing 46, into which areinserted, in a sealed manner, a small piston 48 and a large piston 49. Apressure plate 50 is positioned on the uppermost surface of large piston49. A spring member 52 is positioned between the pressure plate 50 andthe lower inside surface of the housing 46 and is arranged to exert anupwards force on the large piston 49, which increases in magnitude asthe distance between the lower inside surface of the housing 46 and thepressure plate 50 decreases. A pressure regulator 44 is provided tocontrol the pressure within the volume delimited by the housing 46.Control of the pressure in the housing 46 via the pressure regulator 44provides a means to control the vertical position of the seal member 4and may be used in conjunction with the embodiments described above tocompensate for forces arising from the seal member 4 and preventdistortion to the substrate table WT arising therefrom and/or to supportthe seal member 4 in a safe, normally raised, position for the purposesof exchanging the substrate table WT, or elements thereof. However, thisarrangement may also fulfil the function of providing a safety mechanismin case of system failure, as is described below with reference to FIG.12.

FIG. 12 shows the variation in the position along the Z direction of theseal member 4 when supported by a seal member suspension device 26 asdepicted in FIG. 11. Between P0 and P1, the pre-tensioning of the springmember 52 prevents any displacement of the seal member 4 away from themaximal raising position Z_(T). The pre-tension dominates the motion ofpiston 52 and forces the piston 48 (and the seal member 4) into a safetyposition. At P1, the downwards force exerted by the pressure in thehousing 46 equals the pre-tension of the spring member 52. Beyond P1,the spring member 52 is gradually compressed (in order to continue tooppose the forces exerted by the seal member 4 and the pressure in thehousing 46) and the pressure plate 50 and seal member 4 are graduallylowered, the small piston 48 remaining in contact with the pressureplate 50. In the region between P2 and P3, the spring member 52 is fullycompressed and the small piston 48 is in contact with the pressure plate50, the seal member 4 being in its lowest position. If the pressure P isincreased further, however, the small piston 48 will be pushed clear ofthe pressure plate 50 by the pressure in the housing 46, the verticalposition of the seal member 4 increasing rapidly with pressure until itreaches its maximal raised position Z_(T) (in practice, this transitionmay be almost vertical). The operational regime for the purposes ofimaging will be between pressures P2 and P3. In the case of systemfailure leading to excessively low or excessively high pressures withinthe housing 46, the seal member 4 will be pushed to a safety positionZ_(T).

A further immersion lithography solution with a localized liquid supplysystem is shown in FIG. 4. Liquid is supplied by two groove inlets IN oneither side of the projection system PL and is removed by a plurality ofdiscrete outlets OUT arranged radially outwardly of the inlets N. Theinlets IN and OUT can be arranged in a plate with a hole in its centerand through which the projection beam is projected. Liquid is suppliedby one groove inlet IN on one side of the projection system PL andremoved by a plurality of discrete outlets OUT on the other side of theprojection system PL, causing a flow of a thin film of liquid betweenthe projection system PL and the substrate W. The choice of whichcombination of inlet IN and outlets OUT to use can depend on thedirection of movement of the substrate W (the other combination of inletIN and outlets OUT being inactive).

In European patent application no. 03257072.3, hereby incorporated inits entirety by reference, the idea of a twin or dual stage immersionlithography apparatus is disclosed. Such an apparatus is provided withtwo substrate tables for supporting the substrate. Leveling measurementsare carried out with a substrate table at a first position, withoutimmersion liquid, and exposure is carried out with a substrate table ata second position, where immersion liquid is present. Alternatively, theapparatus can have only one substrate table moving between the first andsecond positions.

While embodiments of the present invention have been described inrelation to a seal member, embodiments of the present invention may beapplied to any immersion lithography apparatus and any liquid supplysystem (including relevant parts thereof), in particular, but notexclusively, to any of those liquid supply systems mentioned above andthe bath of liquid as described above.

While specific embodiments of the invention have been described above,it will be appreciated that the invention may be practiced otherwisethan as described. The description is not intended to limit theinvention.

1. A lithographic apparatus, comprising: a substrate table configured tohold a substrate; a projection system arranged to project a patternedbeam of radiation onto a target portion of the substrate; a liquidsupply system member configured to contain a liquid in a space betweenthe projection system and the substrate; and a liquid supply systemmember compensator configured to apply a force to the liquid supplysystem member to at least partially compensate for an interactionbetween the liquid supply system member and the substrate table andcoupled to a frame that is substantially mechanically isolated from theprojection system, the isolated frame capable of supporting at leastpart of a reaction to a force applied by the liquid supply system membercompensator to the liquid supply system member.
 2. The apparatusaccording to claim 1, further comprising a liquid supply system membercompensator controller and a liquid supply system member positiondetermining device, the liquid supply system member compensatorcontroller configured to apply a control force to the liquid supplysystem member, via the liquid supply system member compensator, based ona position of the liquid supply system member as measured by the liquidsupply system member position determining device.
 3. The apparatusaccording to claim 2, wherein the liquid supply system member positiondetermining device is configured to determine a position of the liquidsupply system member, relative to the projection system, a framesupporting at least a part of the projection system, or the framesubstantially mechanically isolated from the projection system but whichsupports the reaction to the force applied by the liquid supply systemmember compensator to the liquid supply system member, along an axissubstantially parallel to the optical axis of the projection system. 4.The apparatus according to claim 2, wherein the liquid supply systemmember position determining device determines a position of the liquidsupply system member in a direction substantially perpendicular to theoptical axis of the projection system.
 5. The apparatus according toclaim 1, further comprising a liquid supply system member compensatorcontroller configured to apply a control force to the liquid supplysystem member, via the liquid supply system member compensator,according to data representing the magnitude of the interaction betweenthe liquid supply system member and the substrate table.
 6. Theapparatus according to claim 1, wherein the liquid supply system membercompensator comprises a focus calibration device configured tocompensate a relative position of the substrate and a plane of bestfocus of the lithographic apparatus according to compensation data. 7.The apparatus according to claim 1, wherein the liquid supply systemmember compensator is coupled to the projection system or a framesupporting at least a part of the projection system, the projectionsystem or frame being capable of supporting via the coupling at leastpart of the reaction to the force applied by the liquid supply systemmember compensator to the liquid supply system member.
 8. The apparatusaccording to claim 1, further comprising a substrate table forcecompensator configured to determine the magnitude of the interactionbetween the liquid supply system member and the substrate table andtransmit data representing the magnitude to the liquid supply systemmember compensator.
 9. The apparatus according to claim 1, wherein theliquid supply system member compensator operates by means of at leastone mechanism selected from the following list: an electromagnetic forceusing the Lorentz principle, an electromagnetic force using thereluctance principle, a bellows, and a mechanical spring.
 10. Alithographic apparatus, comprising: a substrate table configured to holda substrate; a projection system arranged to project a patterned beam ofradiation onto a target portion of the substrate; a liquid supply systemmember configured to contain a liquid in a space between the projectionsystem and the substrate; and a liquid supply system member compensatorconfigured to compensate for a force exerted by the liquid supply systemmember toward the substrate table.
 11. The apparatus according to claim10, further comprising a liquid supply system member compensatorcontroller and a liquid supply system member position determiningdevice, the liquid supply system member compensator controllerconfigured to apply a force to the liquid supply system member based ona position of the liquid supply system member as measured by the liquidsupply system member position determining device.
 12. The apparatusaccording to claim 10, further comprising a liquid supply system membercompensator controller configured to apply a control force to the liquidsupply system member according to data representing the magnitude of theforce applied by the liquid supply system member toward the substratetable.
 13. The apparatus according to claim 10, comprising a liquidsupply system member compensation device configured to apply a force tothe liquid supply system member to at least partially compensate for theforce exerted by the liquid supply system member toward the substratetable and coupled to a frame that is substantially mechanically isolatedfrom the projection system, the isolated frame capable of supporting viathe coupling at least part of the reaction to the force applied by theliquid supply system member compensation device to the liquid supplysystem member.
 14. A device manufacturing method, comprising: containinga liquid in a space between a projection system of a lithographicapparatus and a substrate table using a liquid supply system member;compensating for an interaction between the liquid supply system memberand the substrate table by using a liquid supply system membercompensator coupled to a frame that is substantially mechanicallyisolated from the projection system; and projecting a patternedradiation beam through the liquid onto a target portion of the substrateusing the projection system.
 15. The method according to claim 14,comprising compensating a relative position of the substrate and a planeof best focus of the lithographic apparatus according to compensationdata.
 16. The method according to claim 15, wherein the compensationdata is derived from determining a surface height profile, a surfacetilt profile, or both of the substrate table when disturbed by theinteraction with the liquid supply system member, the surface heightprofile being defined in a direction substantially parallel to theoptical axis of a final element of the projection system and the surfacetilt profile being defined with respect to one or two orthogonal axes ofa plane substantially perpendicular to the optical axis of the finalelement of the projection system.
 17. The method according to claim 15,comprising applying a force to the liquid supply system member to atleast partially compensate for the interaction between the liquid supplysystem member and the substrate table.
 18. The method according to claim17, wherein the isolated frame supports, via the coupling, at least partof the reaction to the force applied by the liquid supply system membercompensator to the liquid supply system member
 19. The method accordingto claim 17, comprising applying a control force to the liquid supplysystem member based on a position of the liquid supply system member.20. The method according to claim 19, comprising determining a positionof the liquid supply system member, relative to the projection system, aframe supporting at least a part of the projection system or the framesubstantially mechanically isolated from the projection system, in adirection substantially parallel to the optical axis of the projectionsystem, determining a position of the liquid supply system member in adirection substantially perpendicular to the optical axis of theprojection system, or both.